Senior Engineer I-Process (Etch)

Location: Gresham, Oregon, United States

Company

hirify.global develops semiconductor technologies and operates a large-scale global manufacturing organization.

What you will do

• Develop and characterize dry etch processes around the 110nm technology node.
• Support technology transfers and sustain newly released production nodes.
• Drive improvements in product quality, wafer yield, process stability, and cost.
• Resolve manufacturing challenges using structured problem-solving methods and prevent recurrence.
• Optimize final product electrical parameters and expand process tool availability.
• Qualify newly purchased tools and expand processes across new platforms.

Requirements

• Bachelor’s degree in Chemical Engineering, Electrical Engineering, Materials Science, Microelectronics Engineering, Physics, Chemistry, or an equivalent field.
• Related experience in a semiconductor processing facility or with a related equipment supplier.
• Experience with design of experiments and process characterization in a manufacturing environment.
• Approximately 5–7.5 years of dry etch experience.
• Ability to perform hands-on work and own process tools in a safety-sensitive manufacturing environment.
• Ability to lift approximately 25 lb, push and pull approximately 60 lb, carry 15 lb, and perform climbing, bending, kneeling, crouching, crawling, and reaching activities.

Nice to have

• Experience with Lam Poly, AMAT DPS Metal, or TEL DRM ownership.
• Knowledge of post-etch solvent or other cleaning strategies.
• Experience with JMP or other statistical data software, fault detection and control software, and rudimentary scripting.
• Semiconductor process integration familiarity and direct technology transfer experience.

Culture & Benefits

• Full-time position with a work environment focused on flexibility, teamwork, creativity, and professional growth.
• Employee development and leadership programs are available.
• Travel requirement is 0%–25%.
• The role is classified as safety sensitive.