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13 часов назад

LTD RET Software/Research Engineer

149 600 - 284 580$
Формат работы
hybrid
Тип работы
fulltime
Грейд
senior
Английский
b2
Страна
US
Вакансия из списка Hirify.GlobalВакансия из Hirify Global, списка международных tech-компаний
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Описание вакансии

Текст:
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TL;DR
LTD RET Software/Research Engineer (Computational Lithography/Semiconductor Technology): Developing and optimizing optical proximity correction and resolution enhancement software for advanced semiconductor process technologies with an accent on mask pattern manipulation, lithography simulation, and fab process data analysis. Focus on designing RET algorithms, validating OPC recipes, supporting production mask tapeout, and solving patterning challenges across current and future process nodes.

Location: Hybrid role based in Hillsboro, Oregon, United States, with time split between the assigned Intel site and off-site work.

Salary: $149,600–$284,580 annual salary.

Company

hirify.global is presented in the posting as an organization developing advanced semiconductor technology through Intel’s Logic Technology Development environment.

What you will do

  • Develop and implement optical proximity correction algorithms and resolution enhancement techniques for existing and novel process technologies.
  • Define, select, optimize, and validate RET approaches and OPC recipe code.
  • Design algorithms for pattern synthesis and mask layout manipulation.
  • Use predictive modeling, statistics, machine learning, and data analysis to study fab process data and develop lithography and etch compensation algorithms.
  • Support production mask tapeout and RET validation.
  • Maintain knowledge of RET and semiconductor technology trends and create technical documentation and presentations.

Requirements

  • Bachelor’s degree in Computer Science, Software Engineering, Electrical Engineering, or a relevant field plus 6+ years of professional semiconductor industry experience; or a master’s degree plus 4+ years; or a Ph.D. plus 2+ years.
  • Hands-on professional experience in pattern synthesis and mask layout manipulation.
  • Knowledge of optical proximity correction concepts and capabilities.

Nice to have

  • Understanding of the latest techniques for developing and optimizing OPC rule-based synthesis solutions for high-volume manufacturing and emerging technology nodes.

Culture & Benefits

  • Collaborative, supportive, and technically challenging work environment.
  • Hybrid work model combining on-site and off-site work.
  • Competitive pay, stock bonuses, health benefits, retirement benefits, and vacation.
  • Full-time experienced-hire position on Shift 1 in the United States.

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