Вакансия из Hirify Global, списка международных tech-компаний Для мэтча и отклика нужен Plus
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$150к-285к/год
$180к$190кмедиана$220к
По похожим ролям (50) ~ $190к/год
На СНГ рынке: $2.5к/мес ($1.9к - $3.1к)
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Роль четко сфокусирована на передовых технологиях литографии и вычислительной инженерии в Intel: задачи конкретны, а работа связана с разработкой полупроводников. При этом требуется узкий отраслевой опыт, поэтому вакансия подойдет специалистам с профильным бэкграундом.
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Узкая специализацияПередовые разработкиПонятные задачи
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Описание вакансии
Текст:
Hirify AI/Оригинал
TL;DR
LTD RET Software/Research Engineer (Computational Lithography/Semiconductor Technology): Developing and optimizing optical proximity correction and resolution enhancement software for advanced semiconductor process technologies with an accent on mask pattern manipulation, lithography simulation, and fab process data analysis. Focus on designing RET algorithms, validating OPC recipes, supporting production mask tapeout, and solving patterning challenges across current and future process nodes.
Location: Hybrid role based in Hillsboro, Oregon, United States, with time split between the assigned Intel site and off-site work.
Salary: $149,600–$284,580 annual salary.
Company
hirify.global is presented in the posting as an organization developing advanced semiconductor technology through Intel’s Logic Technology Development environment.
What you will do
Develop and implement optical proximity correction algorithms and resolution enhancement techniques for existing and novel process technologies.
Define, select, optimize, and validate RET approaches and OPC recipe code.
Design algorithms for pattern synthesis and mask layout manipulation.
Use predictive modeling, statistics, machine learning, and data analysis to study fab process data and develop lithography and etch compensation algorithms.
Support production mask tapeout and RET validation.
Maintain knowledge of RET and semiconductor technology trends and create technical documentation and presentations.
Requirements
Bachelor’s degree in Computer Science, Software Engineering, Electrical Engineering, or a relevant field plus 6+ years of professional semiconductor industry experience; or a master’s degree plus 4+ years; or a Ph.D. plus 2+ years.
Hands-on professional experience in pattern synthesis and mask layout manipulation.
Knowledge of optical proximity correction concepts and capabilities.
Nice to have
Understanding of the latest techniques for developing and optimizing OPC rule-based synthesis solutions for high-volume manufacturing and emerging technology nodes.
Culture & Benefits
Collaborative, supportive, and technically challenging work environment.
Hybrid work model combining on-site and off-site work.
Competitive pay, stock bonuses, health benefits, retirement benefits, and vacation.
Full-time experienced-hire position on Shift 1 in the United States.
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