6 дней назад
Senior Lithography and Photomask Process Engineer (EUV/DUV)
103 000 - 161 000€
Мэтч & Сопровод
Для мэтча с этой вакансией нужен Plus
Описание вакансии
Текст:
TL;DR
Senior Lithography and Photomask Process Engineer (EUV/DUV): Overseeing photomask and reticle operations while developing advanced EUV pellicles and integrating lithography processes for semiconductor manufacturing with an accent on reticle lifecycle management, defect mitigation, and yield improvement. Focus on leading root cause failure analysis, ramping new process nodes, modeling complex process data, and coordinating cross-functional technology transitions.
Location: Leixlip, Ireland. Hybrid work model with time split between the assigned site and off-site work.
Annual salary: €103,000–€161,000.
Company
Foundry develops advanced semiconductor technologies and high-volume manufacturing processes.
What you will do
- Oversee photomask incoming quality control, pellicle integrity, reticle qualification, and lifecycle management across EUV and DUV toolsets.
- Drive next-generation EUV pellicle development, including material optimization, transmission, stability, defect mitigation, and yield improvement.
- Partner with scanner/lithography, reticle design, thin films, etch, and yield enhancement teams to diagnose patterning excursions and accelerate technology transitions.
- Lead root cause failure analysis for lithography- and reticle-related defects during new process node development and high-volume manufacturing.
- Provide technical leadership and mentorship, establish standard operating procedures, and collaborate with lithography and mask equipment suppliers.
Requirements
- M.S. with 8+ years of foundry experience or Ph.D. in electrical engineering, chemical engineering, materials science, physics, optics, microelectronics, or a related semiconductor discipline.
- 8+ years of hands-on process engineering experience in advanced semiconductor lithography and photomask or reticle technologies within high-volume manufacturing or advanced technology development fabs.
- In-depth knowledge of mask fabrication, mask metrology, aerial image modeling, pellicle technology, reticle degradation, and mask defect inspection.
- Experience with DUV ArFi/193nm immersion and EUV exposure systems, including ASML Twinscan/NXE platforms, track integration, and advanced CD metrology.
- Advanced proficiency with SPC, DOE, yield analytics, JMP, Python, or MATLAB for complex data modeling and multivariate analysis.
- Experience leading cross-functional taskforces, preparing technical documentation, and delivering executive briefings.
Culture & Benefits
- Full-time experienced-hire position on Shift 1 in Ireland.
- Hybrid work model combining on-site and off-site work.
- Total compensation package with additional pay components and benefits potentially included.
- Collaborative work with engineering teams and leading lithography and mask equipment suppliers.
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