18 дней назад
Chemist (Semiconductor Lithography)
Мэтч & Сопровод
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Описание вакансии
Текст:
TL;DR
Chemist (Semiconductor Lithography) (BARC/EUV): Developing BARC, EUV underlayer, EUV resist, and new materials for semiconductor lithography with an accent on formulation design, organic chemistry, polymer chemistry, and physical optics. Focus on solving technology challenges, collaborating with material, engineering, and fab operations teams, and securing intellectual property.
Location: Hwaseong-si, Gyeonggi-do, South Korea; the role is based in Dongtan.
Company
develops materials and solutions for advanced electronics and high-tech industries.
What you will do
- Develop BARC, EUV underlayer, EUV resist, and new materials through innovative formulation design.
- Design new concepts and optimize formulations to meet semiconductor performance requirements.
- Resolve technology challenges using scientific methodology, multidisciplinary collaboration, and innovative thinking.
- Collaborate with material, engineering, and fab operations teams on new platform development.
- Manage project goals, progress, development planning, and training activities.
- Create, secure, and manage intellectual property and participate in technical conferences.
Requirements
- PhD in organic chemistry, polymer science, or material science, or a master's degree with relevant experience.
- Expertise in organic chemistry, polymer chemistry and physics, analytical methodology, and physical optics.
- Verbal and written communication skills in English and Korean, including technical writing and presentations.
- Ability to work on semiconductor lithography materials and resolve multidisciplinary technical challenges.
Culture & Benefits
- Full-time position within Litho R&D and Semiconductor Technologies.
- Work focused on advanced electronics, semiconductor materials, and cutting-edge technology development.
- Comprehensive pay and benefits package.
- Equal opportunity workplace with reasonable accommodation available during the application process.
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